The global EUV Mask Defect Inspection Equipment Market was valued at 1502 million in 2024 and is projected to reach US$ 3737 million by 2031, at a CAGR of 14.3% during the forecast period.
EUV Mask Defect Inspection Equipment Market OverviewMask, also known as Photomask or Reticle, is a graphic master used in the lithography process commonly used in microelectronics processing technology. As a carrier of graphic information, Mask transfers the graphic to the base material through the exposure process, thereby realizing the transfer of the graphic.
Mask defect detection is a key link in the semiconductor lithography process, which aims to check the Mask and identify and repair the defects on it. As a critical component in the lithography process, Mask is responsible for accurately transferring the circuit pattern to the wafer, and its quality is directly related to the accuracy of the wafer pattern and the performance of the final device. There are various types of defects, including particle contamination, pattern breakage, bridging problems, and defects in the mask material itself.
Click to Access Your Free Sample Report
EUV Mask defect detection equipment is a special equipment that plays an important role in the high-end semiconductor process technology. Given the high precision required by EUV lithography technology, even the smallest defect on the Mask may significantly affect the quality of the circuit pattern on the wafer, and thus adversely affect the performance and yield of the chip. Therefore, the use of special detection equipment to strictly inspect the EUV Mask is an indispensable key link to ensure the quality of semiconductor manufacturing.
At present, optical detection is the mainstream in semiconductor detection technology. The types of semiconductor optical detection include pattern, non-pattern and mask detection. Among them, pattern defect detection is divided into bright field and dark field detection. Both are analyzed through optical signals. The difference is that the bright field is a vertically reflected light signal, while the dark field is a scattered light signal.
EUV Mask Defect Inspection Equipment Key Market Trends :- Rapid Growth in Advanced Node Adoption
The increasing use of 5nm, 3nm, and 2nm process nodes in chip manufacturing is driving higher demand for precise EUV mask defect inspection equipment. - Monopolization by Key Players
The market is currently dominated by KLA and Lasertec, who are expected to retain their stronghold due to high R&D investment and long delivery cycles. - Growing Role of EUV Lithography
EUV lithography is becoming the cornerstone for high-end semiconductor production, boosting the necessity for advanced defect detection systems. - Increased Fab-Level Deployment
While Mask Shops still dominate usage, Fabs are increasingly integrating EUV inspection equipment to manage pellicle-related inspection requirements. - High Precision Optical Detection Technologies
Optical detection—especially bright field and dark field techniques—is evolving rapidly to meet EUV’s ultra-sensitive defect detection standards.
Global EUV Mask Defect Inspection Equipment market, by Type, 2020-2025, 2026-2031 ($ millions) & (Units)
Global EUV Mask Defect Inspection Equipment market segment percentages, by Type, 2024 (%)
- 5-7nm Process
- 3nm and Below Process
Global EUV Mask Defect Inspection Equipment market, by Application, 2020-2025, 2026-2031 ($ Millions) & (Units)
Global EUV Mask Defect Inspection Equipment market segment percentages, by Application, 2024 (%)
- Mask Shop
- Fab
Competitor Analysis
The report also provides analysis of leading market participants including:
- Key companies EUV Mask Defect Inspection Equipment revenues in global market, 2020-2025 (estimated), ($ millions)
- Key companies EUV Mask Defect Inspection Equipment revenues share in global market, 2024 (%)
- Key companies EUV Mask Defect Inspection Equipment sales in global market, 2020-2025 (estimated), (Units)
- Key companies EUV Mask Defect Inspection Equipment sales share in global market, 2024 (%)
Further, the report presents profiles of competitors in the market, key players include:
- Lasertec
- KLA-Tencor
- Advantest
Request Your Free Sample Report
FAQsQ: What are the key driving factors and opportunities in the EUV Mask Defect Inspection Equipment market?
A: Key drivers include the growing demand for advanced semiconductor nodes (3nm and below), the rise of EUV lithography, and the need for high-precision defect inspection. Opportunities lie in fab-level integration and innovations in detection technologies.
Q: Which region is projected to have the largest market share?
A: Asia-Pacific, particularly Taiwan and South Korea, is expected to lead the market due to high investments in advanced chip manufacturing and strong presence of major fabs.
Q: Who are the top players in the global EUV Mask Defect Inspection Equipment market?
A: The key market players are KLA and Lasertec, who dominate the global market with cutting-edge technologies and long-standing industry partnerships.
Q: What are the latest technological advancements in the industry?
A: Advances include improved bright field/dark field optical inspection, SEM-based detection integration, and better defect detection through pellicles in EUV environments.
Q: What is the current size of the global EUV Mask Defect Inspection Equipment market?
A: The global market was valued at US$ 1,502 million in 2024 and is projected to reach US$ 3,737 million by 2031, growing at a CAGR of 14.3%.